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Title: Ultra Low-{kappa} Metrology Using X-Ray Reflectivity And Small-Angle X-Ray Scattering Techniques

The automated metrology tool, combining X-ray reflectivity XRR and small-angle X-ray scattering SAXS has been demonstrated as a capable equipment to assess standard porous Ultra low-{kappa} (ULK) metrology. Therefore those techniques have enabled characterizations of several ULK used in sub-65 nm nodes integration. Standard ULK material for 65 nm node technology has been monitored through the whole C065 integration steps using those combined techniques.
Authors:
 [1] ;  [2] ; ; ;  [3] ; ;  [4]
  1. Freescale Semiconductor, STMicroelectronics, 850, rue Jean Monnet, 38926 Crolles (France)
  2. STMicroelectronics, 850, rue Jean Monnet, 38926 Crolles (France)
  3. Jordan Valley, Zone 6 Ramat Graviel, Industrial zone, Migdal Ha'Emek 23100 (Israel)
  4. CEA/LETI-MINATEC, 17 rue des martyrs, 38000 Grenoble (France)
Publication Date:
OSTI Identifier:
21032722
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 931; Journal Issue: 1; Conference: 2007 international conference on frontiers of characterization and metrology, Gaithersburg, MD (United States), 27-29 Mar 2007; Other Information: DOI: 10.1063/1.2799395; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; POROUS MATERIALS; REFLECTION; REFLECTIVITY; SMALL ANGLE SCATTERING; X-RAY DIFFRACTION