New Cs sputter ion source with polyatomic ion beams for secondary ion mass spectrometry applications

Journal Article · Wed Aug 15 00:00:00 EDT 2007 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.2761021· OSTI ID:21024147

Belykh, S F; Palitsin, V V; Veryovkin, I V; Kovarsky, A P; Chang, R J. H.; Adriaens, A; Dowsett, M G; Adams, F ^[1]

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1. Department of Physics, University of Warwick, Warwick Conventry CV4 7AL (United Kingdom)

A simple design for a cesium sputter ion source compatible with vacuum and ion-optical systems as well as with electronics of the commercially available Cameca IMS-4f instrument is reported. This ion source has been tested with the cluster primary ions of Si{sub n}{sup -} and Cu{sub n}{sup -}. Our experiments with surface characterization and depth profiling conducted to date demonstrate improvements of the analytical capabilities of the secondary ion mass spectrometry instrument due to the nonadditive enhancement of secondary ion emission and shorter ion ranges of polyatomic projectiles compared to atomic ones with the same impact energy.

• OSTI ID: 21024147
• Journal Information: Review of Scientific Instruments, Vol. 78, Issue 8; Other Information: DOI: 10.1063/1.2761021; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
• Country of Publication: United States
• Language: English

Related Subjects

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
43 PARTICLE ACCELERATORS
CESIUM
CESIUM IONS
DEPTH
DESIGN
ION BEAMS
ION EMISSION
ION MICROPROBE ANALYSIS
ION SOURCES
MASS SPECTROSCOPY
OPTICAL SYSTEMS
OPTICS
SILICON
SPUTTERING
SURFACES