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Title: Nanofabrication on ZnO nanowires

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.2404950· OSTI ID:20880173
; ; ;  [1]
  1. Key Laboratory for Colloid and Interface Chemistry of Education Ministry, Department of Chemistry, Shandong University, Shandong 250100 (China) and National Institute for Materials Science, Namiki 1-1, Tsukuba, Ibaraki 305-0044 (Japan)

ZnO nanowires were subjected to convergent electron beam irradiation in a 300 kV transmission electron microscope. The size of perforated hexagonal pores generated by irradiation can vary with the beam size. An irradiated area is denuded layer by layer via removal of Zn and O atoms. The polar ZnO surfaces have a higher resistance to irradiation than the unpolar ones. Ultrathin nanobridges, {approx}1 nm thick or less, were generated through deliberate removal of Zn and O atomic monolayers.

OSTI ID:
20880173
Journal Information:
Applied Physics Letters, Vol. 89, Issue 24; Other Information: DOI: 10.1063/1.2404950; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English