Preparation and characterization of spray deposited n-type WO{sub 3} thin films for electrochromic devices
The n-type tungsten oxide (WO{sub 3}) polycrystalline thin films have been prepared at an optimized substrate temperature of 250 deg. C by spray pyrolysis technique. Precursor solution of ammonium tungstate ((NH{sub 4}){sub 2}WO{sub 4}) was sprayed onto the well cleaned, pre-heated fluorine doped tin oxide coated (FTO) and glass substrates with a spray rate of 15 ml/min. The structural, surface morphological and optical properties of the as-deposited WO{sub 3} thin films were studied. Mott-Schottky (M-S) studies of WO{sub 3}/FTO electrodes were conducted in Na{sub 2}SO{sub 4} solution to identify their nature and extract semiconductor parameters. The electrochromic properties of the as-deposited and lithiated WO{sub 3}/FTO thin films were analyzed by employing them as working electrodes in three electrode electrochemical cell using an electrolyte containing LiClO{sub 4} in propylene carbonate (PC) solution.
- OSTI ID:
- 20879927
- Journal Information:
- Materials Research Bulletin, Vol. 39, Issue 10; Other Information: DOI: 10.1016/j.materresbull.2004.04.023; PII: S0025540804001217; Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved; Country of input: International Atomic Energy Agency (IAEA); ISSN 0025-5408
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
CARBONIC ACID ESTERS
DOPED MATERIALS
ELECTROCHEMICAL CELLS
ELECTROCHEMISTRY
ELECTRODES
ELECTROLYTES
FLUORINE
GLASS
LITHIUM PERCHLORATES
OPTICAL PROPERTIES
POLYCRYSTALS
PYROLYSIS
SEMICONDUCTOR MATERIALS
SODIUM SULFATES
SPRAYS
SUBSTRATES
THIN FILMS
TIN OXIDES
TUNGSTATES
TUNGSTEN OXIDES
X-RAY DIFFRACTION