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Title: Preparation and characterization of spray deposited n-type WO{sub 3} thin films for electrochromic devices

Journal Article · · Materials Research Bulletin

The n-type tungsten oxide (WO{sub 3}) polycrystalline thin films have been prepared at an optimized substrate temperature of 250 deg. C by spray pyrolysis technique. Precursor solution of ammonium tungstate ((NH{sub 4}){sub 2}WO{sub 4}) was sprayed onto the well cleaned, pre-heated fluorine doped tin oxide coated (FTO) and glass substrates with a spray rate of 15 ml/min. The structural, surface morphological and optical properties of the as-deposited WO{sub 3} thin films were studied. Mott-Schottky (M-S) studies of WO{sub 3}/FTO electrodes were conducted in Na{sub 2}SO{sub 4} solution to identify their nature and extract semiconductor parameters. The electrochromic properties of the as-deposited and lithiated WO{sub 3}/FTO thin films were analyzed by employing them as working electrodes in three electrode electrochemical cell using an electrolyte containing LiClO{sub 4} in propylene carbonate (PC) solution.

OSTI ID:
20879927
Journal Information:
Materials Research Bulletin, Vol. 39, Issue 10; Other Information: DOI: 10.1016/j.materresbull.2004.04.023; PII: S0025540804001217; Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved; Country of input: International Atomic Energy Agency (IAEA); ISSN 0025-5408
Country of Publication:
United States
Language:
English