Anomalous scaling behavior and surface roughening in molecular thin-film deposition

Journal Article · Sat Apr 15 00:00:00 EDT 2006 · Physical Review. B, Condensed Matter and Materials Physics

DOI:https://doi.org/10.1103/PHYSREVB.73.1· OSTI ID:20788075

Yim, S; Jones, T S ^[1]

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1. Centre for Electronic Materials and Devices, Department of Chemistry, Imperial College London, London SW7 2AZ (United Kingdom)

The thin film growth dynamics of a molecular semiconductor, free-base phthalocyanine (H{sub 2}Pc), deposited by organic molecular beam deposition, has been studied by atomic force microscopy (AFM) and height difference correlation function (HDCF) analysis. The measured dynamic scaling components ({alpha}{sub loc}=0.61{+-}0.12, {beta}=1.02{+-}0.08, and 1/z=0.72{+-}0.13) are consistent with rapid surface roughening and anomalous scaling behavior. A detailed analysis of AFM images and simple growth models suggest that this behavior arises from the pronounced upward growth of crystalline H{sub 2}Pc mounds during the initial stages of thin film growth.

• OSTI ID: 20788075
• Journal Information: Physical Review. B, Condensed Matter and Materials Physics, Vol. 73, Issue 16; Other Information: DOI: 10.1103/PhysRevB.73.161305; (c) 2006 The American Physical Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1098-0121
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ATOMIC FORCE MICROSCOPY
CORRELATION FUNCTIONS
CRYSTAL GROWTH
LAYERS
MOLECULAR BEAM EPITAXY
MOLECULAR BEAMS
ORGANIC SEMICONDUCTORS
PHTHALOCYANINES
ROUGHNESS
SURFACES
THIN FILMS