Crack detection and analyses using resonance ultrasonic vibrations in full-size crystalline silicon wafers
- Nanomaterials and Nanomanufacturing Research Center, University of South Florida, 4202 East Fowler Avenue, Tampa, Florida 33620 (United States)
An experimental approach for fast crack detection and length determination in full-size solar-grade crystalline silicon wafers using a resonance ultrasonic vibrations (RUV) technique is presented. The RUV method is based on excitation of the longitudinal ultrasonic vibrations in full-size wafers. Using an external piezoelectric transducer combined with a high sensitivity ultrasonic probe and computer controlled data acquisition system, real-time frequency response analysis can be accomplished. On a set of identical crystalline Si wafers with artificially introduced periphery cracks, it was demonstrated that the crack results in a frequency shift in a selected RUV peak to a lower frequency and increases the resonance peak bandwidth. Both characteristics were found to increase with the length of the crack. The frequency shift and bandwidth increase serve as reliable indicators of the crack appearance in silicon wafers and are suitable for mechanical quality control and fast wafer inspection.
- OSTI ID:
- 20778818
- Journal Information:
- Applied Physics Letters, Vol. 88, Issue 11; Other Information: DOI: 10.1063/1.2186393; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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