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Title: Plasma treatment and its prospective application to polymer light-emitting diodes fabricated by ink-jet printing method

Journal Article · · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
DOI:https://doi.org/10.1116/1.1953707· OSTI ID:20723047
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  1. Department of Metallurgical Engineering, Yonsei University, Seoul 120-749 (Korea, Republic of)

The influence of CF{sub 4} plasma treatment of indium-tin-oxide (ITO) and polyimide (PI) on the patterning of ink-jet printed polymer is presented. Not much difference between the as-received ITO and PI surface energies was found, but a significant difference in surface energies between ITO and PI after CF{sub 4} plasma treatment was noted. It is expected that precise patterning can be achieved by using the difference in surface energies between the inside of the pixel and its surroundings. Also the effects of CF{sub 4} plasma treatment of ITO have been studied on the performance of polymer light-emitting diodes (PLEDs). X-ray photoelectron spectroscopy revealed that CF{sub 4} plasma treatment led to a decrease in the surface content of carbon contaminants and an increase in the surface content of fluorine, which in turn enhance the performance of PLEDs.

OSTI ID:
20723047
Journal Information:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 23, Issue 5; Other Information: DOI: 10.1116/1.1953707; (c) 2005 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0734-2101
Country of Publication:
United States
Language:
English