DCEMS Study of Thin Stainless Steel Films Deposited by RF Sputtering of AISI316L
- School of Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 (Japan)
Thin stainless steel films were prepared on SiO2/Si plate heated at 100 deg. C and 400 deg. C using AISI316L as target, by a RF magnetron Ar sputtering method. RF sputtered-deposited films and the oxidized surface layers by post heating were characterized by depth selective conversion electron Moessbauer spectroscopy (DCEMS) using a He+5%CH4 gas proportional counter. The as-deposited films consisted of magnetic phases, the magnetic orientation of which had a tendency to be perpendicular to the surface of the film. In the case of the deposited films at substrate temperature of 100 deg. C, a small amount of Fe2O3 and ferritic stainless steel formed by post-heating in air. A magnetic subcomponent and a austenite phase were formed in the films deposited at substrate temperature of 400 deg. C. {alpha}-Fe2O3 and magnetite formed easily on the top and middle layers of the films by post-heating in air. The oxide states of the films deposited at different temperatures of substrate were clearly distinguished by post-heating. Thus it was found by DCEMS that the structures of the deposited films were strongly affected by the preparation method and the temperature of the substrate.
- OSTI ID:
- 20722124
- Journal Information:
- AIP Conference Proceedings, Vol. 765, Issue 1; Conference: International symposium on the industrial applications of the Moessbauer effect, Madrid (Spain), 4-8 Oct 2004; Other Information: DOI: 10.1063/1.1923642; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
AIR
ANNEALING
AUSTENITE
DEPOSITION
ELECTRON SPECTROSCOPY
FERRITIC STEELS
HELIUM
IRON OXIDES
MAGNETITE
METHANE
MOESSBAUER EFFECT
PROPORTIONAL COUNTERS
SPUTTERING
STAINLESS STEELS
SUBSTRATES
SURFACES
TEMPERATURE DEPENDENCE
TEMPERATURE RANGE 0273-0400 K
TEMPERATURE RANGE 0400-1000 K
THIN FILMS