Optical Flatness Metrology for 300 mm Silicon Wafers

Journal Article · Fri Sep 09 00:00:00 EDT 2005 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.2063025· OSTI ID:20719275

Griesmann, Ulf; Quandou, Wang ^[1]; Raymond, Thomas D ^[2]

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1. National Institute of Standards and Technology, Manufacturing Engineering Laboratory, Gaithersburg, MD 20899-8223 (United States)
2. WaveFront Sciences Inc., Albuquerque, NM 87123 (United States)

The National Institute of Standards and Technology (NIST) is developing two interferometric methods for measuring the thickness, thickness variation, and flatness of free-standing and chucked silicon wafers with diameters up to 300 mm. The 'eXtremely accurate CALIBration InterferometeR' (XCALIBIR) is a precision phase measuring interferometer with an operating wavelength of 633 nm and a test beam of 300 mm diameter. XCALIBIR is used to evaluate the flatness of chucked wafers. NIST's Infrared Interferometer (IR2) is a phase measuring interferometer that operates at 1.55 {mu}m and is used to measure the thickness variation of free-standing 300 mm silicon wafers.

• OSTI ID: 20719275
• Journal Information: AIP Conference Proceedings, Vol. 788, Issue 1; Conference: 2005 international conference on characterization and metrology for ULSI technology, Richardson, TX (United States), 15-18 Mar 2005; Other Information: DOI: 10.1063/1.2063025; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
ACCURACY
CALIBRATION
INTERFEROMETERS
SEMICONDUCTOR DEVICES
SILICON
THICKNESS
VARIATIONS
WAVELENGTHS