Structural and magnetic properties of NiZn and Zn ferrite thin films obtained by laser ablation deposition
- Department of Physics, Duquesne University, Pittsburgh, Pennsylvania 15282 (United States)
Laser ablation deposition has been used to synthesize nanoscale ferrite structures. Our investigations were performed on NiZn and Zn ferrite films deposited on silicon(100) substrates. Films produced by laser ablation at room temperature were annealed at 550 deg. C for 1 h. Other films were deposited directly at a 550 deg. C substrate temperature without subsequent annealing. Complementary x-ray diffraction and superconducting quantum interference device magnetometry measurements helped identify the optimum laser ablation deposition conditions for obtaining the desired nanoferrite structures. From the hysteresis loops at 300 and 10 K we identified the paramagnetic or ferromagnetic behavior of the films. The zero field cooled-field cooled (ZFC-FC) magnetization, M(T), curves yielded the value of the blocking temperature in both NiZn and Zn ferrite systems.
- OSTI ID:
- 20711627
- Journal Information:
- Journal of Applied Physics, Vol. 97, Issue 10; Conference: 49. annual conference on magnetism and magnetic materials, Jacksonville, FL (United States), 7-11 Nov 2004; Other Information: DOI: 10.1063/1.1854416; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
Similar Records
Effect of cation distribution on the magnetic and hyperfine behaviour of nanocrystalline Co doped Ni–Zn ferrite (Ni{sub 0.4}Zn{sub 0.4}Co{sub 0.2}Fe{sub 2}O{sub 4})
High-frequency magnetic properties of Zn ferrite films deposited by magnetron sputtering
Related Subjects
ABLATION
ANNEALING
ENERGY BEAM DEPOSITION
FERRITE
HYSTERESIS
LASER RADIATION
LASERS
MAGNETIC PROPERTIES
MAGNETIZATION
NANOSTRUCTURES
NICKEL COMPOUNDS
PARAMAGNETISM
PULSED IRRADIATION
SILICON
SQUID DEVICES
TEMPERATURE RANGE 0273-0400 K
TEMPERATURE RANGE 0400-1000 K
THIN FILMS
X-RAY DIFFRACTION
ZINC COMPOUNDS