Residual gas analysis of a dc plasma for carbon nanofiber growth

Journal Article · Mon Nov 01 00:00:00 EST 2004 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.1779975· OSTI ID:20662157

Cruden, Brett A; Cassell, Alan M; Hash, David B; Meyyappan, M ^[1]

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1. Center for Nanotechnology, NASA Ames Research Center, Moffett Field, California 94035 (United States)

We report the analysis of a plasma enhanced chemical vapor deposition process for carbon nanofiber growth. A direct current (dc) plasma is employed with a mixture of acetylene and ammonia. Residual gas analysis is performed on the downstream plasma effluent to determine degrees of precursor dissociation and high molecular weight species formation. Results are correlated to growth quality obtained in the plasma as a function of dc voltage/power, gas mixture, and pressure. Behaviors in plasma chemistry are understood through application of a zero-dimensional model.

• OSTI ID: 20662157
• Journal Information: Journal of Applied Physics, Vol. 96, Issue 9; Other Information: DOI: 10.1063/1.1779975; (c) 2004 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ACETYLENE
AMMONIA
CARBON
CARBON FIBERS
CHEMICAL ANALYSIS
CHEMICAL VAPOR DEPOSITION
CRYSTAL GROWTH
DIRECT CURRENT
DISSOCIATION
ELECTRIC POTENTIAL
GAS ANALYSIS
MOLECULAR WEIGHT
NANOSTRUCTURES
PLASMA
PLASMA DIAGNOSTICS
PLASMA PRESSURE
PLASMA SIMULATION