An Undulator-Wiggler Beamline for Spectromicroscopy at SRC

Journal Article · Wed May 12 00:00:00 EDT 2004 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.1757794· OSTI ID:20652939

Reininger, R ^[1]; De Stasio, G ^[2]; Bissen, M; Severson, M ^[3]

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1. Scientific Answers and Solutions, 5708 Restal St., Madison, WI 53711 (United States)
2. University of Wisconsin - Madison, Department of Physics, Madison, WI, 53706 (United States)
3. Synchrotron Radiation Center, University of Wisconsin-Madison, 3731 Schneider Drive, Stoughton WI 53589 (United States)

A high-flux medium-energy-resolution beamline based on an existing insertion device is being constructed at SRC. The insertion device will be operated as an undulator up to {approx}400 eV and as a wiggler at higher energies. The beamline will be dedicated mainly to X-ray PhotoElectron Emission spectroMicroscopy (X-PEEM) and will cover the energy range 75-2000 eV. The most relevant requirement for high-resolution and high-sensitivity X-PEEM is a high flux density on the sample surface. This will allow spatial resolutions on the order of a few nanometers, and a minimum detection limit on the order of 10 parts per million, using the already existing Spectromicroscope for PHotoelectron Imaging of Nanostructures with X-rays (SPHINX). To maximize the flux at the sample position, the beamline does not include an entrance slit and has only three optical elements on the beam path: an ellipsoidal mirror, a variable-line-spacing plane grating, and a re-focusing ellipsoidal mirror. The first ellipsoidal mirror provides the converging light to one of the three gratings needed to cover the beamline energy range. The position of the fixed exit slit is at the focus of the ellipsoidal mirror when the grating is tuned to zero order. The second ellipsoidal mirror demagnifies the beam at the exit slit plane by a factor of two. More than 1012 photons/s are expected at the sample position between 100 and 1200 eV onto a spot having a FWHM of 25 {mu}m vertical and 70 {mu}m horizontal at a resolving power of {approx}1000.

• OSTI ID: 20652939
• Journal Information: AIP Conference Proceedings, Vol. 705, Issue 1; Conference: 8. international conference on synchrotron radiation instrumentation, San Francisco, CA (United States), 25-29 Aug 2003; Other Information: DOI: 10.1063/1.1757794; (c) 2004 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
BEAM OPTICS
ENERGY RESOLUTION
EV RANGE 10-100
EV RANGE 100-1000
FLUX DENSITY
FOCUSING
KEV RANGE 01-10
MICROSCOPY
MIRRORS
NANOSTRUCTURES
PHOTOEMISSION
PHOTONS
SENSITIVITY
SPATIAL RESOLUTION
SYNCHROTRON RADIATION
WIGGLER MAGNETS
X RADIATION
X-RAY PHOTOELECTRON SPECTROSCOPY
X-RAY SPECTROSCOPY