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Title: New approach to obtain boron selective emitters

Selective emitters, used in high efficiency solar cells, need a series of oxidations and photolithographic steps that render the process more expensive. In this paper, a new way to make selective emitters using boron is presented. The main feature of this approach is to save oxide growths and photolithographic processes and it is based on the property of boron doped silicon surfaces to be resistant to anisotropic etchings like the one performed during the texturization. Using this characteristic of boron emitter surfaces, the authors can obtain a highly doped emitter under metal grid and simultaneously a shield to avoid texture on these surfaces. First cells were processed and short wavelength response of p{sup +}nn{sup +} solar cells was enhanced by using lightly doped boron emitters in the uncovered area.
Authors:
;  [1]
  1. ETSI Telecomunicacion, Madrid (Spain). Inst. de Energia Solar
Publication Date:
OSTI Identifier:
191057
Report Number(s):
CONF-941203--
ISBN 0-7803-1459-X; TRN: IM9610%%58
Resource Type:
Book
Resource Relation:
Conference: 1. world conference on photovoltaic energy conversion, Waikoloa, HI (United States), 5-9 Dec 1994; Other Information: PBD: 1994; Related Information: Is Part Of 1994 IEEE first world conference on photovoltaic energy conversion: Conference record of the twenty-fourth IEEE photovoltaic specialists conference -- 1994. Volume 2; PB: 1268 p.
Publisher:
Inst. of Electrical and Electronics Engineers, Inc., Piscataway, NJ (United States)
Country of Publication:
United States
Language:
English
Subject:
14 SOLAR ENERGY; SILICON SOLAR CELLS; DESIGN; FABRICATION; SILICON OXIDES; METALS; DOPED MATERIALS; BORON; PHOSPHORUS; DIFFUSION; ETCHING; POTASSIUM HYDROXIDES; SURFACE COATING; TEXTURE; ELECTRIC POTENTIAL; CURRENT DENSITY; FILL FACTORS; EFFICIENCY; QUANTUM EFFICIENCY; EXPERIMENTAL DATA