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Title: Solid-State Halogen Atom Source for Chemical Dynamics and Etching

Journal Article · · Applied Physics Letters, 81(6):1140-1142
DOI:https://doi.org/10.1063/1.1488700· OSTI ID:15001606

We describe a solid state Br atom source for surface etching, kinetics, or reaction dynamics studies. Pulsed laser irradiation of crystalline KBr, near the bulk absorption threshold at 6eV, produces hyperthermal Br atmos in dense plumes. The Br atom density and velocities may be controlled by choice of laser pulse power and photon energy. Single and multiple pulse excitation of KBr produces Br and Br* in controllable quantities and velocities, thus providing an attractive UHV compatible solid-state radical atom source. The solid-state atom source is in principle extensible to other halogens using other alkali halides and perhaps other materials.

Research Organization:
Pacific Northwest National Laboratory (PNNL), Richland, WA (US), Environmental Molecular Sciences Laboratory (EMSL)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC05-76RL01830
OSTI ID:
15001606
Report Number(s):
PNNL-SA-35780; 4792; KP1704020; TRN: US200323%%466
Journal Information:
Applied Physics Letters, 81(6):1140-1142, Vol. 81, Issue 6
Country of Publication:
United States
Language:
English

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