Effects of temperature and surface contamination on D retention in ultrathin Li films on TZM

Journal Article · Wed Oct 29 00:00:00 EDT 2014 · Journal of Nuclear Materials

DOI:https://doi.org/10.1016/j.jnucmat.2014.10.048· OSTI ID:1392558

Capece, A. M. ^[1]; Roszell, J. P. ^[2]; Skinner, C. H. ^[1]; Koel, B. E. ^[2]

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1. Princeton Plasma Physics Lab. (PPPL), Princeton, NJ (United States)
2. Princeton Univ., NJ (United States). Dept. of Chemical and Biological Engineering

Here in this work, we investigate deuterium retention at the Mo-Li interface by studying thin Li films three monolayers thick on a TZM Mo alloy. Li films at temperatures between 315 and 460 K were exposed to a deuterium ion beam and D retention was measured using temperature programmed desorption. In the absence of oxygen, D is retained as LiD, and the relative amount of retained D decreases with increasing substrate temperature. In three-monolayer thick lithium oxide films, the amount of D retained was 2.5 times higher than the amount retained as LiD in the metallic Li film. However, oxygen reduces the thermal stability of D in the film, causing D₂O and D₂ to be released from the surface at temperatures 150-200 K below the LiD decomposition temperature. These results highlight the importance of maintaining a metallic Li layer for high D retention in Li films on TZM at elevated temperatures.

• Research Organization: Princeton Univ., NJ (United States)
• Sponsoring Organization: USDOE Office of Science (SC), Fusion Energy Sciences (FES)
• Grant/Contract Number: SC0008598; AC02-09CH11466
• OSTI ID: 1392558
• Alternate ID(s): OSTI ID: 1252224
• Journal Information: Journal of Nuclear Materials, Vol. 463, Issue C; ISSN 0022-3115
• Publisher: Elsevier
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
deuterium retention
lithium
Li thin films
molybdenum
oxidation