Ion plasma sources based on a microwave oven
Journal Article
·
· Instruments and Experimental Techniques
OSTI ID:136442
- Kiev Polytechnic Institute (Ukraine)
A domestic microwave oven with a vacuum ionization chamber inside can be used as a composite ion plasma source. The microwave discharge in the chamber is a source of charged particles and plasma. The power fed into the discharge can be up to 500 W at a frequency of 2.45 GHz, and the pressure in the chamber can be 0.1-1000 Pa. The microwave devices for material processing and film deposition are described.
- OSTI ID:
- 136442
- Journal Information:
- Instruments and Experimental Techniques, Vol. 37, Issue 5; Other Information: PBD: Apr 1995; TN: Translated from Pribory i Tekhnika Eksperimenta; No. 5, 176-180(Sep-Oct 1994)
- Country of Publication:
- United States
- Language:
- English
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