Lattice dynamics and thermoelectric properties of nanocrystalline silicon-germanium alloys: Lattice dynamics and thermoelectric properties of nc Si-Ge alloys
- Jülich Centre for Neutron Science JCNS and Peter Grünberg Institut PGI, JARA-FIT, Forschungszentrum Jülich GmbH, 52425 Jülich Germany; Faculté des Sciences, Université de Liège, 4000 Liège Belgium
- Faculty of Engineering and Center for Nano-integration Duisburg-Essen (CENIDE), University of Duisburg-Essen, 47057 Duisburg Germany
- Peter Grünberg Institut PGI-5, Forschungszentrum Jülich GmbH, 52425 Jülich Germany
- Institut Laue Langevin, 71 Avenue des Martyrs, 38000 Grenoble France
- Jülich Centre for Neutron Science JCNS and Peter Grünberg Institut PGI, JARA-FIT, Forschungszentrum Jülich GmbH, 52425 Jülich Germany
- Jülich Centre for Neutron Science JCNS and Peter Grünberg Institut PGI, JARA-FIT, Forschungszentrum Jülich GmbH, 52425 Jülich Germany; Faculté des Sciences, Université de Liège, 4000 Liège Belgium; Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 USA
The lattice dynamics and thermoelectric properties of sintered phosphorus-doped nanostructured silicon–germanium alloys obtained by gas-phase synthesis were studied. Measurements of the density of phonon states by inelastic neutron scattering were combined with measurements of the elastic constants and the low-temperature heat capacity. A strong influence of nanostructuring and alloying on the lattice dynamics was observed. The thermoelectric transport properties of samples with different doping as well as samples sintered at different temperature were characterized between room temperature and 1000°C. A peak figure of merit zT=0.88 at 900°C is observed and is comparatively insensitive to the aforementioned parameter variations.
- Research Organization:
- Argonne National Laboratory (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
- Sponsoring Organization:
- FOREIGN
- OSTI ID:
- 1351330
- Journal Information:
- Physica Status Solidi. A, Applications and Materials Science, Vol. 213, Issue 3; ISSN 1862-6300
- Publisher:
- Wiley
- Country of Publication:
- United States
- Language:
- ENGLISH
A Theoretical Simulation of the Radiation Responses of Si, Ge, and Si/Ge Superlattice to Low-Energy Irradiation
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journal | May 2018 |
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