Inductively Coupled BCl3/Cl2/Ar Plasma Etching of High Al Content AlGaN.

Conference · Thu Oct 01 00:00:00 EDT 2015

OSTI ID:1332044

Douglas, Erica Ann; Allerman, Andrew A.; Baca, Albert G.; Sanchez, Carlos Anthony; Kaplar, Robert

Abstract not provided.

• Research Organization: Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
• Sponsoring Organization: USDOE National Nuclear Security Administration (NNSA)
• DOE Contract Number: AC04-94AL85000
• OSTI ID: 1332044
• Report Number(s): SAND2015-9066C; 607927
• Resource Relation: Conference: Proposed for presentation at the Electrochemical Society Meeting held October 11-16, 2015 in Phoenix, Az.
• Country of Publication: United States
• Language: English