Metal Oxide Transistors via Polyethylenimine Doping of the Channel Layer: Interplay of Doping, Microstructure, and Charge Transport

Huang, Wei; Zeng, Li; Yu, Xinge; Guo, Peijun; Wang, Binghao; Ma, Qing; Chang, Robert P.  H.; Yu, Junsheng; Bedzyk, Michael J.; Marks, Tobin J.; Facchetti, Antonio

doi:10.1002/adfm.201602069

Title: Metal Oxide Transistors via Polyethylenimine Doping of the Channel Layer: Interplay of Doping, Microstructure, and Charge Transport

Journal Article · Tue Nov 08 00:00:00 EST 2016 · Advanced Functional Materials

DOI:https://doi.org/10.1002/adfm.201602069· OSTI ID:1328790

Huang, Wei ^[1]; Zeng, Li ^[2]; Yu, Xinge ^[3]; Guo, Peijun ^[4]; Wang, Binghao ^[3]; Ma, Qing ^[5]; Chang, Robert P. H. ^[4]; Yu, Junsheng ^[6]; Bedzyk, Michael J. ^[2]; Marks, Tobin J. ^[3]; Facchetti, Antonio ^[7]

Department of Chemistry and the Materials Research Center, Northwestern University, 2145, Sheridan Road Evanston IL 60208 USA; State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, University of Electronic Science and Technology of China (UESTC), Chengdu 610054 China
Applied Physics Program and the Materials Research Center, Northwestern University, 2220 Campus Drive Evanston IL 60208 USA
Department of Chemistry and the Materials Research Center, Northwestern University, 2145, Sheridan Road Evanston IL 60208 USA
Department of Materials Science and the Materials Research Center, Northwestern University, 2220 Campus Drive Evanston IL 60208 USA
DND-CAT Synchrotron Research Center APS/ANL Building, 432A, 9700 S. Cass Ave. Argonne IL 60439 USA
State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, University of Electronic Science and Technology of China (UESTC), Chengdu 610054 China
Department of Chemistry and the Materials Research Center, Northwestern University, 2145, Sheridan Road Evanston IL 60208 USA; Polyera Corporation, 8045 Lamon Avenue Skokie IL 60077 USA

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Research Organization:: Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)

Sponsoring Organization:: NSFU.S. OFFICE OF NAVAL RESEARCH

OSTI ID:: 1328790

Journal Information:: Advanced Functional Materials, Vol. 26, Issue 34; ISSN 1616-301X

Publisher:: Wiley

Country of Publication:: United States

Language:: ENGLISH

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