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Title: Ion implantation system and process for ultrasensitive determination of target isotopes

A system and process are disclosed for ultrasensitive determination of target isotopes of analytical interest in a sample. Target isotopes may be implanted in an implant area on a high-purity substrate to pre-concentrate the target isotopes free of contaminants. A known quantity of a tracer isotope may also be implanted. Target isotopes and tracer isotopes may be determined in a mass spectrometer. The present invention provides ultrasensitive determination of target isotopes in the sample.
Authors:
;
Publication Date:
OSTI Identifier:
1324641
Report Number(s):
9,443,708
14/482,332
DOE Contract Number:
AC05-76RL01830
Resource Type:
Patent
Resource Relation:
Patent File Date: 2014 Sep 10
Research Org:
Pacific Northwest National Laboratory (PNNL), Richland, WA (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
07 ISOTOPE AND RADIATION SOURCES; 47 OTHER INSTRUMENTATION