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Title: Contact Resistance Degradation Caused By Plasma Charging of Silicon on Insulator During Contact Etch.

Abstract not provided.
Authors:
; ;
Publication Date:
OSTI Identifier:
1315019
Report Number(s):
SAND2014-19515C
541029
DOE Contract Number:
AC04-94AL85000
Resource Type:
Conference
Resource Relation:
Conference: Proposed for presentation at the American Vacuum Society Symposium held November 10-14, 2014 in Baltimore, MD.
Research Org:
Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org:
USDOE National Nuclear Security Administration (NNSA)
Country of Publication:
United States
Language:
English