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Title: The role of film interfaces in near-ultraviolet absorption and pulsed-laser damage in ion-beam-sputtered coatings based on HfO2/SiO2 thin-film pairs

Journal Article · · Proceedings of SPIE - The International Society for Optical Engineering
DOI:https://doi.org/10.1117/12.2196654· OSTI ID:1264157
 [1];  [2];  [2];  [2];  [2];  [1];  [1];  [1]
  1. Univ. of Rochester, Rochester, NY (United States); Laser Zentrum Hannover e.V. (Germany)
  2. Univ. of Rochester, Rochester, NY (United States)
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The role of thin-film interfaces in the near-ultraviolet absorption and pulsed-laser–induced damage was studied for ion-beam–sputtered and electron-beam–evaporated coatings comprised from HfO2 and SiO2 thin-film pairs. To separate contributions from the bulk of the film and from interfacial areas, absorption and damage-threshold measurements were performed for a one-wave (355-nm wavelength) thick, HfO2 single-layer film and for a film containing seven narrow HfO2 layers separated by SiO2 layers. The seven-layer film was designed to have a total optical thickness of HfO2 layers, equal to one wave at 355 nm and an E-field peak and average intensity similar to a single-layer HfO2 film. Absorption in both types of films was measured using laser calorimetry and photothermal heterodyne imaging. The results showed a small contribution to total absorption from thin-film interfaces, as compared to HfO2 film material. The relevance of obtained absorption data to coating near-ultraviolet, nanosecond-pulse laser damage was verified by measuring the damage threshold and characterizing damage morphology. The results of this study revealed a higher damage resistance in the seven-layer coating as compared to the single-layer HfO2 film in both sputtered and evaporated coatings. Here, the results are explained through the similarity of interfacial film structure with structure formed during the co-deposition of HfO2 and SiO2 materials.

Research Organization:
Univ. of Rochester, NY (United States). Lab. for Laser Energetics
Sponsoring Organization:
USDOE
Grant/Contract Number:
NA0001944
OSTI ID:
1264157
Journal Information:
Proceedings of SPIE - The International Society for Optical Engineering, Vol. 9632; Conference: Laser-Induced damage in optical materials, Boulder, CO (United States), 27 Sep 2015
Publisher:
SPIECopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 1 work
Citation information provided by
Web of Science

References (7)

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Measuring the absolute absorptance of optical laser components journal January 1998
Laser calorimetric absorptance testing of samples with varying geometry conference November 2013
Near-ultraviolet absorption and nanosecond-pulse-laser damage in HfO 2 monolayers studied by submicrometer-resolution photothermal heterodyne imaging and atomic force microscopy journal June 2011
Nanosecond laser-induced damage of nodular defects in dielectric multilayer mirrors [Invited] journal November 2013
Vacancy and interstitial defects in hafnia journal May 2002
First principles study of the structural, electronic, and dielectric properties of amorphous HfO 2 journal September 2011

Cited By (1)

The Optical Absorption and Photoluminescence Characteristics of Evaporated and IAD HfO2 Thin Films journal May 2019

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Related Subjects

36 MATERIALS SCIENCE
thin films
interfaces
absorption
laser damage