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Title: High performance as-grown and annealed high band gap tunnel junctions: Te behavior at the interface

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4951690· OSTI ID:1253928

Sponsoring Organization:
USDOE
Grant/Contract Number:
EE0005403
OSTI ID:
1253928
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Vol. 108 Journal Issue: 20; ISSN 0003-6951
Publisher:
American Institute of PhysicsCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 13 works
Citation information provided by
Web of Science

References (16)

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Band parameters for III–V compound semiconductors and their alloys journal June 2001
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A two‐junction cascade solar‐cell structure journal January 1979
Highly conductive p  + +  -AlGaAs/n  + +  -GaInP tunnel junctions for ultra-high concentrator solar cells : Highly conductive p journal February 2014
Te doping of GaInP: Ordering and step structure journal April 1999
Analysis of tellurium as n-type dopant in GaInP: Doping, diffusion, memory effect and surfactant properties journal January 2007
Theory of Tunneling journal January 1961
Tellurium doping of InGaP for tunnel junction applications in triple junction solar cells journal January 2011
Resonant electron tunneling through defects in GaAs tunnel diodes journal November 2008
III–V compound multi-junction solar cells: present and future journal January 2003
Mechanism of Zn and Si diffusion from a highly doped tunnel junction for InGaP/GaAs tandem solar cells journal February 1999
Calculated natural band offsets of all II–VI and III–V semiconductors: Chemical trends and the role of cation d orbitals journal April 1998