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Title: Evolution of crystal structure during the initial stages of ZnO atomic layer deposition

Journal Article · · Chemistry of Materials
 [1];  [1];  [2];  [1];  [1];  [1];  [1];  [1];  [3];  [3];  [4];  [1];  [1];  [1];  [5];  [5];  [5];  [3]
  1. Univ. of Grenoble Alpes, Grenoble (France)
  2. Aix-Marseille Univ., and CNRS/IN2P3, Marseille (France); European Synchrotron Radiation Facility, Grenoble (France)
  3. Aix-Marseille Univ., and CNRS/IN2P3, Marseille (France)
  4. Argonne National Lab. (ANL), Argonne, IL (United States)
  5. Synchrotron SOLEIL - Beamline SIRIUS, Gif sur Yvette (France)

In this study, a complementary suite of in situ synchrotron X-ray techniques is used to investigate both structural and chemical evolution during ZnO growth by atomic layer deposition. Focusing on the first 10 cycles of growth, we observe that the structure formed during the coalescence stage largely determines the overall microstructure of the film. Furthermore, by comparing ZnO growth on silicon with a native oxide with that on Al2O3(001), we find that even with lattice-mismatched substrates and low deposition temperatures, the crystalline texture of the films depend strongly on the nature of the interfacial bonds.

Research Organization:
Argonne National Laboratory (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
AC02-06CH11357
OSTI ID:
1248882
Journal Information:
Chemistry of Materials, Vol. 28, Issue 2; ISSN 0897-4756
Publisher:
American Chemical Society (ACS)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 26 works
Citation information provided by
Web of Science

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Cited By (6)

Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition journal November 2016
The initial stages of ZnO atomic layer deposition on atomically flat In 0.53 Ga 0.47 As substrates journal January 2018
In Situ Ellipsometry Study of the Early Stage of ZnO Atomic Layer Deposition on In 0.53 Ga 0.47 As journal January 2020
Development of a hybrid molecular beam epitaxy deposition system for in situ surface x-ray studies journal March 2018
Evaluation of Alternative Atomistic Models for the Incipient Growth of ZnO by Atomic Layer Deposition journal March 2017
FORTE – a multipurpose high-vacuum diffractometer for tender X-ray diffraction and spectroscopy at the SIRIUS beamline of Synchrotron SOLEIL journal May 2019

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