Evolution of crystal structure during the initial stages of ZnO atomic layer deposition
Journal Article
·
· Chemistry of Materials
- Univ. of Grenoble Alpes, Grenoble (France)
- Aix-Marseille Univ., and CNRS/IN2P3, Marseille (France); European Synchrotron Radiation Facility, Grenoble (France)
- Aix-Marseille Univ., and CNRS/IN2P3, Marseille (France)
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Synchrotron SOLEIL - Beamline SIRIUS, Gif sur Yvette (France)
In this study, a complementary suite of in situ synchrotron X-ray techniques is used to investigate both structural and chemical evolution during ZnO growth by atomic layer deposition. Focusing on the first 10 cycles of growth, we observe that the structure formed during the coalescence stage largely determines the overall microstructure of the film. Furthermore, by comparing ZnO growth on silicon with a native oxide with that on Al2O3(001), we find that even with lattice-mismatched substrates and low deposition temperatures, the crystalline texture of the films depend strongly on the nature of the interfacial bonds.
- Research Organization:
- Argonne National Laboratory (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- AC02-06CH11357
- OSTI ID:
- 1248882
- Journal Information:
- Chemistry of Materials, Vol. 28, Issue 2; ISSN 0897-4756
- Publisher:
- American Chemical Society (ACS)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 26 works
Citation information provided by
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Web of Science
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