Measurement of optical scattered power from laser-induced shallow pits on silica
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
We describe a model for far-field scattered power and irradiance by a silica glass slab with a shallow-pitted exit surface and is experimentally validated. The comparison to the model is performed using a precisely micromachined ensemble of ~11 μm wide laser ablated shallow pits producing 1% of the incident beam scatter in a 10 mrad angle. This series of samples with damage initiations and laser-induced shallow pits resulting from 351 nm, 5 ns pulsed laser cleaning of metal microparticles at different fluences between 2 J/cm2 and 11 J/cm2 are characterized as well and found in good agreement with model predictions.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE
- Grant/Contract Number:
- AC52-07NA27344; 14-ERD-098
- OSTI ID:
- 1242003
- Alternate ID(s):
- OSTI ID: 1222422
- Report Number(s):
- LLNL-JRNL-673988; APOPAI
- Journal Information:
- Applied Optics, Vol. 54, Issue 28; ISSN 0003-6935
- Publisher:
- Optical Society of America (OSA)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 13 works
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