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Title: Achieving Hard X-ray Nanofocusing Using a Wedged Multilayer Laue Lens

Here, we report on the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using a sputtering deposition technique, in which a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray characterization shows an efficiency of 27% and a focus size of 26 nm at 14.6 keV, in a good agreement with theoretical calculations. Our results indicate that the desired wedging is achieved in the fabricated structure. Furthermore, we anticipate that continuous development on wedged MLLs will advance x-ray nanofocusing optics to new frontiers and enrich capabilities and opportunities for hard X-ray microscopy.
 [1] ;  [2] ;  [1] ;  [1] ;  [3] ;  [3] ;  [1] ;  [1] ;  [1] ;  [3] ;  [4] ;  [1] ;  [1]
  1. Brookhaven National Lab. (BNL), Upton, NY (United States)
  2. Brookhaven National Lab. (BNL), Upton, NY (United States); Argonne National Lab. (ANL), Argonne, IL (United States)
  3. Argonne National Lab. (ANL), Argonne, IL (United States)
  4. Univ. College London, Bloomsbury (United Kingdom); Research Complex at Harwell, Oxfordshire (United Kingdom)
Publication Date:
OSTI Identifier:
Report Number(s):
Journal ID: ISSN 1094-4087
DOE Contract Number:
Resource Type:
Journal Article
Resource Relation:
Journal Name: Optics Express; Journal Volume: 23; Journal Issue: 10
Optical Society of America (OSA)
Research Org:
Brookhaven National Laboratory (BNL), Upton, NY (United States)
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Country of Publication:
United States