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Title: Control of ion energy distributions using phase shifting in multi-frequency capacitively coupled plasmas

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4922631· OSTI ID:1228183
ORCiD logo [1];  [2]; ORCiD logo [3];  [2];  [1]
  1. Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave, Ann Arbor, Michigan 48109, USA
  2. Nuclear Engineering Department, North Carolina State University, 2500 Stinson Drive, Raleigh, North Carolina 27695, USA
  3. MKS Instruments, Inc. 100 Highpower Road, Rochester, New York 14623, USA

Sponsoring Organization:
USDOE
Grant/Contract Number:
SC0001319
OSTI ID:
1228183
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Vol. 117 Journal Issue: 23; ISSN 0021-8979
Publisher:
American Institute of PhysicsCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 49 works
Citation information provided by
Web of Science

References (39)

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Optimization of the electrical asymmetry effect in dual-frequency capacitively coupled radio frequency discharges: Experiment, simulation, and model journal September 2009
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The electrical asymmetry effect in multi-frequency capacitively coupled radio frequency discharges journal January 2011
Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design journal September 2009
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Electron heating and control of ion properties in capacitive discharges driven by customized voltage waveforms journal November 2013
Control of ion energy distribution at substrates during plasma processing journal July 2000
Numerical simulations of electrical asymmetry effect on electronegative plasmas in capacitively coupled rf discharge journal January 2011
RF and Microwave Transistor Oscillator Design book April 2007
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Separate control of the ion flux and ion energy in capacitively coupled radio-frequency discharges using voltage waveform tailoring journal September 2012
Control and optimization of the slope asymmetry effect in tailored voltage waveforms for capacitively coupled plasmas journal December 2014
Ion energy distribution control in single and dual frequency capacitive plasma sources journal January 2005
Experimental investigations of electron density and ion energy distributions in dual-frequency capacitively coupled plasmas for Ar/CF 4 and Ar/O 2 / CF 4 discharges journal January 2014
Electron heating mechanisms in dual-frequency capacitive discharges journal March 2007
Radio-frequency capacitively coupled plasmas excited by tailored voltage waveforms: comparison of experiment and particle-in-cell simulations journal May 2013
Particle-in-cell simulation of ion energy distributions on an electrode by applying tailored bias waveforms in the afterglow of a pulsed plasma journal April 2011
Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma journal July 2000
Making a geometrically asymmetric capacitive rf discharge electrically symmetric journal January 2011
Properties of c-C[sub 4]F[sub 8] inductively coupled plasmas. II. Plasma chemistry and reaction mechanism for modeling of Ar/c-C[sub 4]F[sub 8]/O[sub 2] discharges
  • Vasenkov, Alex V.; Li, Xi; Oehrlein, Gottlieb S.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 22, Issue 3 https://doi.org/10.1116/1.1697483
journal January 2004
Effect of simultaneous source and bias pulsing in inductively coupled plasma etching journal November 2009
Ion Energy Distribution Skew Control Using Phase-Locked Harmonic RF Bias Drive journal July 2014
The effect of the driving frequencies on the electrical asymmetry of dual-frequency capacitively coupled plasmas journal October 2012
Frequency dependence of the electrical asymmetry effect in dual-frequency capacitively coupled discharges journal April 2013
PIC simulations of the separate control of ion flux and energy in CCRF discharges via the electrical asymmetry effect journal December 2008
Deposition of microcrystalline intrinsic silicon by the Electrical Asymmetry Effect technique journal January 2013
Controlling VUV photon fluxes in low-pressure inductively coupled plasmas journal May 2015
Integrated feature scale modeling of plasma processing of porous and solid SiO2. II. Residual fluorocarbon polymer stripping and barrier layer deposition journal July 2004
Heating of a dual frequency capacitively coupled plasma via the plasma series resonance journal October 2007
The electrical asymmetry effect in geometrically asymmetric capacitive radio frequency plasmas journal September 2012
Integrated plasma equipment model for polysilicon etch profiles in an inductively coupled plasma reactor with subwafer and superwafer topography
  • Hoekstra, Robert J.; Grapperhaus, Michael J.; Kushner, Mark J.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 15, Issue 4 https://doi.org/10.1116/1.580659
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The influence of the electrical asymmetry effect on deposition uniformity of thin silicon film journal April 2013
Cross Sections and Swarm Coefficients for Nitrogen Ions and Neutrals in N 2 and Argon Ions and Neutrals in Ar for Energies from 0.1 eV to 10 keV journal May 1991

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