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Title: Processing and crystallographic structure of non-equilibrium Si-doped HfO[subscript 2]

Authors:
; ; ; ;  [1]
  1. NCSU
Publication Date:
OSTI Identifier:
1225084
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 117; Journal Issue: (24) ; 06, 2015
Research Org:
Advanced Photon Source (APS), Argonne National Laboratory (ANL), Argonne, IL (US)
Sponsoring Org:
DOE - BASIC ENERGY SCIENCESFOREIGN
Country of Publication:
United States
Language:
ENGLISH