Atomic layer deposition of Al-incorporated Zn(O,S) thin films with tunable electrical properties
- Harvard University, Cambridge, Massachusetts 02138, USA
- IBM T. J. Watson Research Center, Yorktown Heights, New York 10598, USA
- IBM T. J. Watson Research Center, Yorktown Heights, New York 10598, USA, Duke University, Durham, North Carolina 27708, USA
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 1224302
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Vol. 105 Journal Issue: 20; ISSN 0003-6951
- Publisher:
- American Institute of PhysicsCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 15 works
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