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Title: Low-Cost Growth of III-V Layers on Si Using Close-Spaced Vapor Transport

Close-spaced vapor transport (CSVT) uses solid precursors to deposit material at high rates and with high precursor utilization. The use of solid precursors could significantly reduce the costs associated with III-V photovoltaics, particularly if growth on Si substrates can be demonstrated. We present preliminary results of the growth of GaAs1-xPx with x ≈ 0.3 and 0.6, showing that CSVT can be used to produce III-V-V’ alloys with band gaps suitable for tandem devices. Additionally, we have grown GaAs on Si by first thermally depositing films of Ge and subsequently depositing GaAs by CSVT. Patterning the Ge into islands prevents cracking due to thermal mismatch and is useful for potential tandem structures.
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Conference: Photovoltaic Specialist Conference (PVSC), 2015 IEEE 42nd in New Orleans, USA
Research Org:
Materials Science Institute, University of Oregon; Molecular Foundry, Lawrence Berkeley National Laboratory
Sponsoring Org:
USDOE Office of Energy Efficiency and Renewable Energy (EERE), Solar Energy Technologies Office (EE-4S)
Country of Publication:
United States
14 SOLAR ENERGY; 36 MATERIALS SCIENCE; III-V semiconductor materials, epitaxial layers, microstructure, silicon