Nickel Oxide Interlayer Films from Nickel Formate-Ethylenediamine Precursor: Influence of Annealing on Thin Film Properties and Photovoltaic Device Performance

Steirer, Kenneth Xerxes; Richards, Robin; Sigdel, Ajaya; Garcia, Andres; Ndione, Paul; Hammond, Scott; Baker, Darick; Ratcliff, Erin L.; Curtis, Calvin; Furtak, Tom; Ginley, David S.; Olson, Dana C.; Armstrong, Neal R.; Berry, Joseph J.

doi:10.1039/C5TA01379H

Title: Nickel Oxide Interlayer Films from Nickel Formate-Ethylenediamine Precursor: Influence of Annealing on Thin Film Properties and Photovoltaic Device Performance

Journal Article · Thu May 28 00:00:00 EDT 2015 · Journal of Materials Chemistry A

DOI:https://doi.org/10.1039/C5TA01379H· OSTI ID:1220683

Steirer, Kenneth Xerxes; Richards, Robin; Sigdel, Ajaya; Garcia, Andres; Ndione, Paul; Hammond, Scott; Baker, Darick; Ratcliff, Erin L.; Curtis, Calvin; Furtak, Tom; Ginley, David S.; Olson, Dana C.; Armstrong, Neal R.; Berry, Joseph J.

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Research Organization:: Energy Frontier Research Centers (EFRC) (United States). Center for Interface Science: Solar Electric Materials (CISSEM); National Renewable Energy Lab. (NREL), Golden, CO (United States)

Sponsoring Organization:: NREL Laboratory Directed Research and Development (LDRD)

Contributing Organization:: University of Arizona, Tucson, Arizona; University of Denver, Denver, Colorado; Colorado School of Mines, Golden, Colorado

OSTI ID:: 1220683

Report Number(s):: NREL/JA-5K00-63806

Journal Information:: Journal of Materials Chemistry A, Vol. 3, Issue 20

Country of Publication:: United States

Language:: English

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Title: Nickel Oxide Interlayer Films from Nickel Formate-Ethylenediamine Precursor: Influence of Annealing on Thin Film Properties and Photovoltaic Device Performance

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