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Title: Pulsed plasma etching for semiconductor manufacturing

Authors:
Publication Date:
OSTI Identifier:
1211878
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Physics. D, Applied Physics; Journal Volume: 47; Journal Issue: 30
Sponsoring Org:
USDOE Office of Science (SC), Fusion Energy Sciences (FES)
Country of Publication:
United States
Language:
English