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Title: Pressure-induced structures of Si-doped HfO[subscript 2]

Authors:
; ; ; ; ;  [1] ;  [2] ;  [2]
  1. NPU-China
  2. (
Publication Date:
OSTI Identifier:
1186933
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 117; Journal Issue: (23) ; 06, 2015
Publisher:
American Institute of Physics (AIP)
Research Org:
Advanced Photon Source (APS), Argonne National Laboratory (ANL), Argonne, IL (US)
Sponsoring Org:
DOE - BASIC ENERGY SCIENCESNSFDOE-NNSA
Country of Publication:
United States
Language:
ENGLISH