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Title: Poly(dimethylsiloxane-b-methyl methacrylate): A Promising Candidate for Sub-10 nm Patterning

Authors:
; ; ; ; ; ; ; ; ; ;  [1] ;  [2]
  1. UCSB
  2. (
Publication Date:
OSTI Identifier:
1186927
Resource Type:
Journal Article
Resource Relation:
Journal Name: Macromolecules; Journal Volume: 48; Journal Issue: (11) ; 06, 2015
Publisher:
American Chemical Society
Research Org:
Advanced Photon Source (APS), Argonne National Laboratory (ANL), Argonne, IL (US)
Sponsoring Org:
INDUSTRY
Country of Publication:
United States
Language:
ENGLISH