Field-effect P-N junction
Patent
·
OSTI ID:1179021
This disclosure provides systems, methods, and apparatus related to field-effect p-n junctions. In one aspect, a device includes an ohmic contact, a semiconductor layer disposed on the ohmic contact, at least one rectifying contact disposed on the semiconductor layer, a gate including a layer disposed on the at least one rectifying contact and the semiconductor layer and a gate contact disposed on the layer. A lateral width of the rectifying contact is less than a semiconductor depletion width of the semiconductor layer. The gate contact is electrically connected to the ohmic contact to create a self-gating feedback loop that is configured to maintain a gate electric field of the gate.
- Research Organization:
- Argonne National Laboratory (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC02-05CH11231
- Assignee:
- The Regents of the University of California (Oakland, CA)
- Patent Number(s):
- 9,024,367
- Application Number:
- 13/773,985
- OSTI ID:
- 1179021
- Resource Relation:
- Patent File Date: 2013 Feb 22
- Country of Publication:
- United States
- Language:
- English
Similar Records
Analytical theory of the space-charge region of lateral p-n junctions in nanofilms
Integrated laser and field effect transistor
Enhancement of short-circuit current by use of wide bandgap n-layers in p-i-n amorphous silicon photovoltaic cells
Journal Article
·
Tue Jul 21 00:00:00 EDT 2015
· Journal of Applied Physics
·
OSTI ID:1179021
Integrated laser and field effect transistor
Patent
·
Tue Aug 26 00:00:00 EDT 1986
·
OSTI ID:1179021
Enhancement of short-circuit current by use of wide bandgap n-layers in p-i-n amorphous silicon photovoltaic cells
Patent
·
Tue Oct 08 00:00:00 EDT 1991
·
OSTI ID:1179021