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Title: Template–polymer commensurability and directed self-assembly block copolymer lithography

Authors:
 [1] ;  [2] ;  [3] ;  [3] ;  [3] ;  [1]
  1. National Institute of Standards and Technology, Gaithersburg, MD (United States)
  2. Univ. of Maryland, College Park, MD (United States)
  3. San Jose Research Center, San Jose, CA (United States). A Western Digital Company.
Publication Date:
OSTI Identifier:
1177440
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Polymer Science. Part B, Polymer Physics; Journal Volume: 53; Journal Issue: 8
Publisher:
Wiley
Research Org:
Argonne National Laboratory (ANL), Argonne, IL (United States). Advanced Photon Source (APS).
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Country of Publication:
United States
Language:
ENGLISH
Subject:
block copolymers; lithography; SAXS; self-assembly