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Title: Post-Remediation Radiological Dose Assessment, Linde Site, Tonawanda, New York

Technical Report ·
DOI:https://doi.org/10.2172/1177293· OSTI ID:1177293
 [1];  [1]
  1. Argonne National Lab. (ANL), Argonne, IL (United States)

A post-remediation radiological dose assessment was conducted for the Formerly Utilized Sites Remedial Action Program (FUSRAP) Linde Site by using the measured residual concentrations of the radionuclides of concern following the completion of the soils remedial action. The site’s FUSRAP-related contaminants of concern (COCs) are radionuclides associated with uranium processing activities conducted by the Manhattan Engineer District (MED) in support of the Nation’s early atomic energy and weapons program and include radium-226 (Ra-226), thorium-230 (Th-230), and total uranium (Utotal). Remedial actions to address Linde Site soils and structures were conducted in accordance with the Record of Decision for the Linde Site, Tonawanda, New York (ROD) (USACE 2000a). In the ROD, the U.S. Army Corps of Engineers (USACE) determined that the cleanup standards found in Title 40, Part 192 of the Code of Federal Regulations (40 CFR Part 192), the standards for cleanup of uranium mill sites designated under the Uranium Mill Tailings Radiation Control Act (UMTRCA), and the Nuclear Regulatory Commission (NRC) standards for decommissioning of licensed uranium and thorium mills, found in 10 CFR Part 40, Appendix A, Criterion 6(6), are Applicable or Relevant and Appropriate Requirements (ARARs) for cleanup of MED-related contamination at the Linde Site. The major elements of this remedy will involve excavation of the soils with COCs above soil cleanup levels and placement of clean materials to meet the other criteria of 40 CFR Part 192.

Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE; Department of Defense - U.S. Army Corps of Engineers
DOE Contract Number:
AC02-06CH11357
OSTI ID:
1177293
Report Number(s):
ANL/EVS-14/11; 108901
Country of Publication:
United States
Language:
English

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