Method of fabricating a high aspect ratio microstructure
Patent
·
OSTI ID:1174305
The present invention is for a method of fabricating a high aspect ratio, freestanding microstructure. The fabrication method modifies the exposure process for SU-8, an negative-acting, ultraviolet-sensitive photoresist used for microfabrication whereby a UV-absorbent glass substrate, chosen for complete absorption of UV radiation at 380 nanometers or less, is coated with a negative photoresist, exposed and developed according to standard practice. This UV absorbent glass enables the fabrication of cylindrical cavities in a negative photoresist microstructures that have aspect ratios of 8:1.
- Research Organization:
- Brookhaven National Laboratory (BNL), Upton, NY (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC02-98CH10886
- Assignee:
- Brookhaven Science Associates, LLC (Upton, NY)
- Patent Number(s):
- 6,558,868
- Application Number:
- 09/785,053
- OSTI ID:
- 1174305
- Country of Publication:
- United States
- Language:
- English
Application of the LIGA process for fabrication of gas avalanche devices
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journal | June 2000 |
Micromachining applications of a high resolution ultrathick photoresist
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journal | November 1995 |
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