Glass strengthening and patterning methods

Harper, David C; Wereszczak, Andrew A; Duty, Chad E

Title: Glass strengthening and patterning methods

Patent · Tue Jan 27 00:00:00 EST 2015

OSTI ID:1168728

Harper, David C; Wereszczak, Andrew A; Duty, Chad E

High intensity plasma-arc heat sources, such as a plasma-arc lamp, are used to irradiate glass, glass ceramics and/or ceramic materials to strengthen the glass. The same high intensity plasma-arc heat source may also be used to form a permanent pattern on the glass surface--the pattern being raised above the glass surface and integral with the glass (formed of the same material) by use of, for example, a screen-printed ink composition having been irradiated by the heat source.

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Research Organization:: Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)

Sponsoring Organization:: USDOE

DOE Contract Number:: AC05-00OR22725

Assignee:: UT-Battelle, LLC (Oak Ridge, TN

Patent Number(s):: 8,938,993

Application Number:: 12/957,202

OSTI ID:: 1168728

Country of Publication:: United States

Language:: English

References (24)

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