Etalon-induced baseline drift and correction in atom flux sensors based on atomic absorption spectroscopy
- Pacific Northwest National Lab. (PNNL), Richland, WA (United States)
Atom flux sensors based on atomic absorption (AA) spectroscopy are of significant interest in thin film growth as they can provide unobtrusive, element specific, real-time flux sensing and control. The ultimate sensitivity and performance of the sensors are strongly affected by the long-term and short term baseline drift. Here we demonstrate that an etalon effect resulting from temperature changes in optical viewport housings is a major source of signal instability which has not been previously considered or corrected by existing methods. We show that small temperature variations in the fused silica viewports can introduce intensity modulations of up to 1.5%, which in turn significantly deteriorate AA sensor performance. Furthermore, this undesirable effect can be at least partially eliminated by reducing the size of the beam and tilting the incident light beam off the viewport normal.
- Research Organization:
- Pacific Northwest National Laboratory (PNNL), Richland, WA (United States). Environmental Molecular Sciences Laboratory (EMSL)
- Sponsoring Organization:
- USDOE
- Grant/Contract Number:
- AC05-76RL01830; 10122
- OSTI ID:
- 1167296
- Alternate ID(s):
- OSTI ID: 1224244
- Report Number(s):
- PNNL-SA-102491; APPLAB; 47862; KP1704020
- Journal Information:
- Applied Physics Letters, Vol. 105, Issue 16; ISSN 0003-6951
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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