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Title: HiPIMS: a New Generation of Film Deposition Techniques for SRF Applications

Over the years, Nb/Cu technology, despite its shortcomings due to the commonly used magnetron sputtering, has positioned itself as an alternative route for the future of accelerator superconducting structures. Avenues for the production of thin films tailored for Superconducting RF (SRF) applications are showing promise with recent developments in ionized PVD coating techniques, i.e. vacuum deposition techniques using energetic ions. Among these techniques, High power impulse magnetron sputtering (HiPIMS) is a promising emerging technique which combines magnetron sputtering with a pulsed power approach. This contribution describes the benefits of energetic condensation for SRF films and the characteristics of the HiPIMS technology. It describes the on-going efforts pursued in different institutions to exploit the potential of this technology to produce bulk-like Nb films and go beyond Nb performance with the development of film systems, based on other superconducting materials and multilayer structures.
  1. JLAB
Publication Date:
OSTI Identifier:
Report Number(s):
JLAB-ACC-13-1808; DOE/OR/23177-3238
DOE Contract Number:
Resource Type:
Resource Relation:
Conference: SRF 2013, 23-27 Sept 2013. Paris, France
Research Org:
Thomas Jefferson National Accelerator Facility, Newport News, VA (United States)
Sponsoring Org:
USDOE Office of Science (SC)
Country of Publication:
United States