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Title: Impurity-induced disorder in III-nitride materials and devices

A method for impurity-induced disordering in III-nitride materials comprises growing a III-nitride heterostructure at a growth temperature and doping the heterostructure layers with a dopant during or after the growth of the heterostructure and post-growth annealing of the heterostructure. The post-growth annealing temperature can be sufficiently high to induce disorder of the heterostructure layer interfaces.
Authors:
;
Publication Date:
OSTI Identifier:
1164349
Report Number(s):
8,895,335
13/558,516
DOE Contract Number:
AC04-94AL85000
Resource Type:
Patent
Research Org:
Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE