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Title: Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair

Authors:
 [1] ;  [2] ;  [2] ;  [3] ;  [4] ;  [1]
  1. University of Tennessee, Knoxville (UTK)
  2. The University of Tennessee
  3. ORNL
  4. Graz University of Technology
Publication Date:
OSTI Identifier:
1163601
DOE Contract Number:
DE-AC05-00OR22725
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics A; Journal Volume: 1
Research Org:
Oak Ridge National Laboratory (ORNL); Center for Nanophase Materials Sciences (CNMS)
Sponsoring Org:
SC USDOE - Office of Science (SC)
Country of Publication:
United States
Language:
English