A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

Anders, André

doi:10.1016/j.surfcoat.2014.08.043

Title: A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

Journal Article · Tue Sep 02 00:00:00 EDT 2014 · Surface and Coatings Technology

DOI:https://doi.org/10.1016/j.surfcoat.2014.08.043· OSTI ID:1163234

Anders, André ^[1]

Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)

In this study, high power impulse magnetron sputtering (HiPIMS) has been in the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition. It should not come at a surprise that many extension and variations of HiPIMS make use, intentionally or unintentionally, of previously discovered approaches to film processing such as substrate surface preparation by metal ion sputtering and phased biasing for film texture and stress control. Therefore, in this review, an overview is given on some historical developments and features of cathodic arc and HiPIMS plasmas, showing commonalities and differences. To limit the scope, emphasis is put on plasma properties, as opposed to surveying the vast literature on specific film materials and their properties.

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Research Organization:: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)

Sponsoring Organization:: USDOE Office of Science (SC)

Grant/Contract Number:: AC02-05CH11231

OSTI ID:: 1163234

Alternate ID(s):: OSTI ID: 1556729

Report Number(s):: LBNL-6822E; TRN: US1600665

Journal Information:: Surface and Coatings Technology, Vol. 257, Issue C; ISSN 0257-8972

Publisher:: ElsevierCopyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 175 works

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