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Properties of titanium oxide film prepared by reactive cathodic vacuum arc deposition
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July 1999 |
Synthesis and characterization of zirconium oxynitride coatings deposited by filtered cathodic vacuum arc technology
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August 2013 |
Arc deposition of Ti–Si–C–N thin films from binary and ternary cathodes — Comparing sources of C
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December 2012 |
On the relationship between the peak target current and the morphology of chromium nitride thin films deposited by reactive high power pulsed magnetron sputtering
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December 2008 |
Reactive deposition of Al–N coatings in Ar/N2 atmospheres using pulsed-DC or high power impulse magnetron sputtering discharges
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August 2010 |
The properties of TiN ultra-thin films grown on SiO2 substrate by reactive high power impulse magnetron sputtering under various growth angles
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December 2013 |
Three-dimensional thickness and property distribution of TiC films deposited by DC magnetron sputtering and HIPIMS
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July 2014 |
Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides
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September 2011 |
Hysteresis-free deposition of niobium oxide films by HiPIMS using different pulse management strategies
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January 2012 |
Evaporation-assisted high-power impulse magnetron sputtering: The deposition of tungsten oxide as a case study
- Hemberg, Axel; Dauchot, Jean-Pierre; Snyders, Rony
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Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 30, Issue 4
https://doi.org/10.1116/1.4722728
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July 2012 |
Deposition of zinc oxide layers by high-power impulse magnetron sputtering
- Konstantinidis, S.; Hemberg, A.; Dauchot, J. P.
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 25, Issue 3
https://doi.org/10.1116/1.2735968
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January 2007 |
Applications of HIPIMS metal oxides
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December 2013 |
Deposition of yttria-stabilized zirconia thin films by high power impulse magnetron sputtering and pulsed magnetron sputtering
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February 2014 |
HiPIMS deposition of TiOx in an industrial-scale apparatus: Effects of target size and deposition geometry on hysteresis
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November 2013 |
Heat treatable indium tin oxide films deposited with high power pulse magnetron sputtering
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March 2009 |
Tribological and oxidation behaviour of TiAlCN/VCN nanoscale multilayer coating deposited by the combined HIPIMS/(HIPIMS-UBM) technique
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January 2011 |
High temperature tribological performance of CrAlYN/CrN nanoscale multilayer coatings deposited on γ-TiAl
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June 2009 |
High‐rate deposition of Al 2 O 3 films using modified cathodic arc plasma deposition processes
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May 1989 |
High deposition rate of aluminum oxide film by off-plane double bend filtered cathodic vacuum arc technique
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May 2001 |
A high-current pulsed cathodic vacuum arc plasma source
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November 2003 |
A new generation of filtered arc sources for ultrathin top coats on magnetic hard disks
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November 2004 |
On the film density using high power impulse magnetron sputtering
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October 2010 |
Deposition rates of high power impulse magnetron sputtering: Physics and economics
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July 2010 |
The physical reason for the apparently low deposition rate during high-power pulsed magnetron sputtering
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April 2008 |
High rate deposition of thick CrN and Cr2N coatings using modulated pulse power (MPP) magnetron sputtering
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February 2011 |
Process stabilization and enhancement of deposition rate during reactive high power pulsed magnetron sputtering of zirconium oxide
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July 2008 |
Cathodic arc evaporation of (Ti,Al)N coatings and (Ti,Al)N/TiN multilayer-coatings—correlation between lifetime of coated cutting tools, structural and mechanical film properties
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January 2004 |
Cathodic arc sources and macroparticle filtering
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November 1997 |
Impact of Annealing on the Conductivity of Amorphous Carbon Films Incorporating Copper and Gold Nanoparticles Deposited by Pulsed Dual Cathodic Arc
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May 2009 |
Synthesis and in-situ ellipsometric monitoring of Ti/C nanostructured multilayers using a high-current, dual source pulsed cathodic arc
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June 2005 |
Deposition of epitaxial Ti2AlC thin films by pulsed cathodic arc
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March 2007 |
Synthesis and characterization of arc deposited magnetic (Cr,Mn) 2 AlC MAX phase films: Synthesis and characterization of arc deposited magnetic (Cr,Mn) 2 AlC MAX phase films
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April 2014 |
Dual magnetron sputtering (DMS) system with sine-wave power supply for large-area coating
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January 1998 |
Characterisation studies of the pulsed dual cathode magnetron sputtering process for oxide films
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July 2001 |
Discharge in dual magnetron sputtering system
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April 2005 |
Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti–Cu thin films
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August 2010 |
Time-Resolved Diagnostics of Dual High Power Impulse Magnetron Sputtering With Pulse Delays of 15 µs and 500 µs
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March 2011 |
Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering
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February 2012 |
Synthesis of nano-structured HPPMS CrN/AlN coatings
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February 2013 |
The Mn+1AXn phases: Materials science and thin-film processing
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February 2010 |
High-power impulse magnetron sputtering and its applications
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April 2010 |
Industrial-scale deposition of highly adherent CNx films on steel substrates
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August 2010 |
Growth of Ti-C nanocomposite films by reactive high power impulse magnetron sputtering under industrial conditions
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January 2012 |
Pressure dependence of the Al ion energy distribution functions during filtered cathodic arc thin film growth in an Ar, O 2 ambient
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December 2008 |