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Title: A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

In this study, high power impulse magnetron sputtering (HiPIMS) has been in the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition. It should not come at a surprise that many extension and variations of HiPIMS make use, intentionally or unintentionally, of previously discovered approaches to film processing such as substrate surface preparation by metal ion sputtering and phased biasing for film texture and stress control. Therefore, in this review, an overview is given on some historical developments and features of cathodic arc and HiPIMS plasmas, showing commonalities and differences. To limit the scope, emphasis is put on plasma properties, as opposed to surveying the vast literature on specific film materials and their properties.
  1. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Publication Date:
OSTI Identifier:
Report Number(s):
Journal ID: ISSN 0257-8972; TRN: US1600665
Grant/Contract Number:
Accepted Manuscript
Journal Name:
Surface and Coatings Technology
Additional Journal Information:
Journal Volume: 257; Journal Issue: C; Journal ID: ISSN 0257-8972
Research Org:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org:
USDOE Office of Science (SC)
Country of Publication:
United States
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; cathodic arcs; high power impulse magnetron sputtering; HiPIMS; bias; deposition; review