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Title: A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope

Authors:
 [1] ;  [1] ;  [1] ;  [2] ;  [1] ;  [1] ;  [1] ;  [1]
  1. LBNL Materials Science Division
  2. University of California, Berkeley
Publication Date:
OSTI Identifier:
1163231
Report Number(s):
LBNL-6805E
Journal ID: ISSN 0277-786X
DOE Contract Number:
DE-AC02-05CH11231
Resource Type:
Journal Article
Resource Relation:
Journal Name: Proceedings of SPIE - The International Society for Optical Engineering; Journal Volume: 9235; Conference: Conference Volume 9235: Photomask Technology 2014; Related Information: Journal Publication Date: Oct. 2014
Research Org:
Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE