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Title: Amorphous W–S–N thin films: The atomic structure behind ultra-low friction

Authors:
 [1] ;  [1] ;  [2] ;  [3] ;  [1] ;  [3] ;  [1] ;  [2] ;  [1] ;  [4]
  1. Uppsala Univ., Uppsala (Sweden)
  2. Indian Institute of Science, Bangalore (India)
  3. Illinois Inst. of Technology, Chicago, IL (United States)
  4. Uppsala Univ., Uppsala (Sweden); Wigner Research Centre for Physics, Budapest (Hungary)
Publication Date:
OSTI Identifier:
1162302
Resource Type:
Journal Article
Resource Relation:
Journal Name: Acta Materialia; Journal Volume: 82; Journal Issue: C
Publisher:
Elsevier
Research Org:
Argonne National Laboratory (ANL), Argonne, IL (United States). Advanced Photon Source (APS).
Sponsoring Org:
FOREIGN
Country of Publication:
United States
Language:
ENGLISH
Subject:
tribology; thin films; Ab initio calculations; EXAFS; WS2