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Title: Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography

Authors:
; ; ;  [1]
  1. (UMM)
Publication Date:
OSTI Identifier:
1149627
Resource Type:
Journal Article
Resource Relation:
Journal Name: Macromolecules; Journal Volume: 47; Journal Issue: (4) ; 02, 2014
Research Org:
Advanced Photon Source (APS), Argonne National Laboratory (ANL), Argonne, IL (US)
Sponsoring Org:
DOE - BASIC ENERGY SCIENCESINDUSTRY
Country of Publication:
United States
Language:
ENGLISH