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Title: Off-Normal Patterned Etching Through Suspended Membranes.

Abstract

Abstract not provided.

Authors:
; ; ;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1140777
Report Number(s):
SAND2014-0767C
498657
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Conference
Resource Relation:
Conference: Proposed for presentation at the SPIE Photonics West held February 2-6, 2014 in San Francisco, CA.
Country of Publication:
United States
Language:
English

Citation Formats

Burckel, David Bruce, Jarecki, Robert L.,, Resnick, Paul James, Henry, Michael David, and Finnegan, Patrick Sean. Off-Normal Patterned Etching Through Suspended Membranes.. United States: N. p., 2014. Web.
Burckel, David Bruce, Jarecki, Robert L.,, Resnick, Paul James, Henry, Michael David, & Finnegan, Patrick Sean. Off-Normal Patterned Etching Through Suspended Membranes.. United States.
Burckel, David Bruce, Jarecki, Robert L.,, Resnick, Paul James, Henry, Michael David, and Finnegan, Patrick Sean. 2014. "Off-Normal Patterned Etching Through Suspended Membranes.". United States. https://www.osti.gov/servlets/purl/1140777.
@article{osti_1140777,
title = {Off-Normal Patterned Etching Through Suspended Membranes.},
author = {Burckel, David Bruce and Jarecki, Robert L., and Resnick, Paul James and Henry, Michael David and Finnegan, Patrick Sean},
abstractNote = {Abstract not provided.},
doi = {},
url = {https://www.osti.gov/biblio/1140777}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Wed Jan 01 00:00:00 EST 2014},
month = {Wed Jan 01 00:00:00 EST 2014}
}

Conference:
Other availability
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