Direct chemical vapor deposition of graphene on dielectric surfaces

Zhang, Yuegang; Ismach, Ariel

Title: Direct chemical vapor deposition of graphene on dielectric surfaces

Patent · Tue Apr 29 00:00:00 EDT 2014

OSTI ID:1130059

Zhang, Yuegang; Ismach, Ariel

A substrate is provided that has a metallic layer on a substrate surface of a substrate. A film made of a two dimensional (2-D) material, such as graphene, is deposited on a metallic surface of the metallic layer. The metallic layer is dewet and/or removed to provide the film on the substrate surface.

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Research Organization:: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)

Sponsoring Organization:: USDOE

DOE Contract Number:: AC02-05CH11231

Assignee:: The Regents of the University of California (Oakland, CA)

Patent Number(s):: 8,709,881

Application Number:: 13/098,929

OSTI ID:: 1130059

Resource Relation:: Patent File Date: 2011 May 02

Country of Publication:: United States

Language:: English

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