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Title: Ellipsometry

Ellipsometry is a technique often used to measure the thickness and properties of a thin film. This article covers the instrumental, theoretical, and practical aspects of this technique. Notably, different types of instruments including nulling ellipsometer, rotating compensator ellipsometer, and photoelastic modulator ellipsometer designs are presented. Elements of proper data analysis are also included, such as the use of an error-based figure of merit.
Authors:
 [1] ;  [2]
  1. University of Toledo
  2. ORNL
Publication Date:
OSTI Identifier:
1126966
DOE Contract Number:
DE-AC05-00OR22725
Resource Type:
Book
Publisher:
Elsevier, New York, NY, USA
Research Org:
Oak Ridge National Laboratory (ORNL)
Sponsoring Org:
NNSA USDOE - National Nuclear Security Administration (NNSA)
Country of Publication:
United States
Language:
English
Subject:
Complex reflection coefficients; Complex reflection ratio; Ellipsometry; Film thickness; Jones matrix; Mueller matrix; Nulling ellipsometer; Photoelastic modulator ellipsometer; Polarization state analyzer; Polarization state generator; Rotating compensato